These were written as an array of 6nm dots, and during processing some of the dots have fallen over. From the dots that have fallen over, it is apparent that the feature width is preserved for the length of the dot.
6 layers overlay with 7nm nanowire
Beam resolution test typical result.
20nm metal-lift-off
±15% uniformity
10nm feature capability
Metal-lift-off line is a standard test for machine acceptance.
The specified line width uniformity requires the uniformity of beam size and beam writing
Lift-off presents true beam size and beam quality.